RF Plasma Generator 300W
At PM Electronics, we are a leading manufacturer in India, specializing in cutting-edge RF power solutions for semiconductor processing, plasma etching, thin film deposition, physical vapor deposition, and sputtering. Our advanced systems are engineered to deliver exceptional performance, efficiency, and reliability, ensuring precise control in plasma-based applications.
Our 13.56 MHz Plasma etching RF generator is designed for high-performance plasma processing, offering superior power stability and minimal signal noise. With advanced features, it provides a dynamic response to plasma, making it ideal for critical manufacturing and research applications.
To further enhance precision and efficiency, our RF generator with matching network ensures seamless impedance matching, optimizing power delivery for stable and uniform plasma generation. This integration enables faster tuning, reduced power loss, and improved process repeatability, essential for high-tech industries.
Additionally, our Digital control RF generator offers full digital control, enabling real-time adjustments, remote monitoring, and automation capabilities. This allows manufacturers to fine-tune plasma conditions with unparalleled accuracy, leading to higher yields and consistent results in semiconductor fabrication and material processing.
With a proven track record in serving government R&D institutes and industrial clients, our RF solutions are built for durability, precision, and adaptability, ensuring optimal efficiency across various demanding applications.
Specs
- Output forward Power: 0-300 Watt
- Reflected Power: 0 to 150 Watt
- Carrier Frequency: 13.56 MHz
- Harmonic: -30 dBc below fundamental
- Output Impedance: 50 Ohm
- Output connector: N type Female
- Display of capacitor match point position
- Display of Interlock fault status
- Cooling: Convection Air-Cooling
- Dimension: 47.5×30.0x8.5 cm